Inpria Co-Developing Metal Oxide Resist with SK hynix to Reduce Complexity of Patterning for Next-Generation DRAM
JSR Corporation announced today acceleration of its co-development with SK hynix Inc. to apply Inpria, a JSR company’s Extreme Ultraviolet (EUV) metal oxide resist (MOR) for manufacturing advanced DRAM chips. Inpria’s broadly-patented metal oxide photoresist platform for EUV enables customers to efficiently pattern advanced node device architectures.
JSR Closes Deal to Acquire EUV Pioneer Inpria Corporation
JSR is proud to announce that it completed the acquisition of Corvallis, OR-based Inpria Corporation on Oct. 29, making it a wholly owned subsidiary of JSR. Inpria, now a JSR company, is a world leader in metal oxide photoresist design, development and manufacturing for extreme ultraviolet (EUV) lithography.
JSR Agrees to Acquire EUV Pioneer Inpria Corporation
JSR announced today that it has signed an agreement for the acquisition of Corvallis, OR based Inpria Corporation, the world’s leading innovator of metal oxide photoresist design, development and manufacturing for extreme ultraviolet (EUV) lithography, for USD $514 million. EUV technology is already in use in commercial production in the most advanced lithography processes used in semiconductor manufacturing and, as the industry moves to smaller critical dimensions in chip manufacturing, its use is expected to increase substantially.
